JPH0748666Y2 - スパッタリング装置 - Google Patents

スパッタリング装置

Info

Publication number
JPH0748666Y2
JPH0748666Y2 JP1990022025U JP2202590U JPH0748666Y2 JP H0748666 Y2 JPH0748666 Y2 JP H0748666Y2 JP 1990022025 U JP1990022025 U JP 1990022025U JP 2202590 U JP2202590 U JP 2202590U JP H0748666 Y2 JPH0748666 Y2 JP H0748666Y2
Authority
JP
Japan
Prior art keywords
target
annular
magnetic
block
shaped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990022025U
Other languages
English (en)
Japanese (ja)
Other versions
JPH03115659U (en]
Inventor
武広 桜井
Original Assignee
日電アネルバ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日電アネルバ株式会社 filed Critical 日電アネルバ株式会社
Priority to JP1990022025U priority Critical patent/JPH0748666Y2/ja
Publication of JPH03115659U publication Critical patent/JPH03115659U/ja
Application granted granted Critical
Publication of JPH0748666Y2 publication Critical patent/JPH0748666Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1990022025U 1990-03-05 1990-03-05 スパッタリング装置 Expired - Lifetime JPH0748666Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990022025U JPH0748666Y2 (ja) 1990-03-05 1990-03-05 スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990022025U JPH0748666Y2 (ja) 1990-03-05 1990-03-05 スパッタリング装置

Publications (2)

Publication Number Publication Date
JPH03115659U JPH03115659U (en]) 1991-11-29
JPH0748666Y2 true JPH0748666Y2 (ja) 1995-11-08

Family

ID=31525051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990022025U Expired - Lifetime JPH0748666Y2 (ja) 1990-03-05 1990-03-05 スパッタリング装置

Country Status (1)

Country Link
JP (1) JPH0748666Y2 (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5300066B2 (ja) * 2009-04-15 2013-09-25 株式会社昭和真空 マグネトロンカソード
KR20240101688A (ko) * 2021-12-14 2024-07-02 닛신덴키 가부시키 가이샤 스퍼터링 장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194171A (ja) * 1989-01-20 1990-07-31 Ulvac Corp マグネトロンスパッタリング源

Also Published As

Publication number Publication date
JPH03115659U (en]) 1991-11-29

Similar Documents

Publication Publication Date Title
US4060470A (en) Sputtering apparatus and method
US4370217A (en) Target assembly comprising, for use in a magnetron-type sputtering device, a magnetic target plate and permanent magnet pieces
US5174880A (en) Magnetron sputter gun target assembly with distributed magnetic field
JP2962912B2 (ja) 陰極スパッタリング装置で基板を被覆するためのスパッタカソード
JP3798039B2 (ja) スパッタ装置のマグネトロンカソード電極
JPH0748666Y2 (ja) スパッタリング装置
JPH02163373A (ja) 薄膜形成装置
JPH02194171A (ja) マグネトロンスパッタリング源
JP2008025001A (ja) マグネトロンスパッタリング装置
JPH0525625A (ja) マグネトロンスパツタカソード
JP4270669B2 (ja) 強磁性体のマグネトロンスパッタ方法および装置
JPH0342035Y2 (en])
JP2660716B2 (ja) マグネトロン型スパッタ装置
JP3000417U (ja) 陰極スパッタリング装置
JP4489868B2 (ja) カソード電極装置及びスパッタリング装置
JP4071861B2 (ja) 薄膜形成装置
JPH0734244A (ja) マグネトロン型スパッタカソード
JPH0241585B2 (en])
JP2714826B2 (ja) マグネトロンスパッタリング装置
JPS6039158A (ja) マグネトロン型スパツタリング用タ−ゲツト
JP2604442B2 (ja) マグネトロンスパッタ装置
JP2580149B2 (ja) スパツタ装置
JPH076061B2 (ja) マグネトロンスパッタ装置
JP2823862B2 (ja) マグネトロンスパッタ装置
JPH02273323A (ja) 強磁性体のスパツタリング装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term